Gas supplying apparatus, cylinder cabinet provided with the same, valve box, and substrate process apparatus
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United States of America Patent
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Oct 7, 2014
Grant Date -
Sep 6, 2012
app pub date -
Mar 1, 2012
filing date -
Mar 3, 2011
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A disclosed gas supplying apparatus includes a pressure controller that reduces a primary pressure thereby providing a secondary pressure greater than a process pressure at which a predetermined process is performed and less than the atmospheric pressure in a secondary pipe; a pressure sensor that measures a pressure in the secondary pipe; a first open/close valve provided in the secondary pipe; an open/close valve controller that opens or closes the first open/close valve; a pressure comparator that compares the pressure measured by the pressure sensor in the secondary pipe with a first set pressure that is greater than the process pressure by a predetermined pressure; and a controller that outputs a signal to the open/close valve controller thereby closing the first open/close valve, when the pressure comparator determines that the pressure in the secondary pipe is less than the first set pressure.
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