Method of isolating nanowires from a substrate

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United States of America Patent

PATENT NO 8853067
APP PUB NO 20130334499A1
SERIAL NO

13957965

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Abstract

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A method is provided. The method includes forming a plurality of nanowires on a top surface of a substrate and forming an oxide layer adjacent to a bottom surface of each of the plurality of nanowires, wherein the oxide layer is to isolate each of the plurality of nanowires from the substrate.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chu-Kung, Benjamin Hillsboro, US 216 2242
Jin, Been-Yin Lake Oswego, US 9 84
Pillarisetty, Ravi Portland, US 449 7371
Rachmady, Willy Beaverton, US 426 5639
Radosavljevic, Marko Beaverton, US 465 4738
Shah, Uday Portland, US 159 4625

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