Substrate processing apparatus and substrate processing method

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United States of America Patent

PATENT NO 8865483
APP PUB NO 20140045281A1
SERIAL NO

13956705

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a substrate processing apparatus in which flexibility of disposing a device configured to determine a holding state of a substrate and the flexibility of timing of determining the holding state are enhanced. The substrate processing apparatus includes a light projector configured to radiate detection light toward a region where a substrate may exist when the substrate is held by a substrate holding member and a light receiver configured to receive the detection light radiated from the light projector. A light path of the detection light from the light projector toward the light receiver passes a substrate surrounding member installed around the substrate held by the substrate holding member. The detection light penetrates the substrate surrounding member and has a wavelength which does not penetrate the substrate.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aiura, Kazuhiro Kumamoto, JP 19 71
Hashimoto, Yusuke Kumamoto, JP 91 381
Itoh, Norihiro Kumamoto, JP 15 63
Nagai, Takashi Kumamoto, JP 94 853

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