Method for producing titanium metal

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United States of America Patent

PATENT NO 8871303
APP PUB NO 20120070578A1
SERIAL NO

13322779

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Abstract

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Disclosed is a method for producing titanium metal, which comprises: (a) a step in which a mixed gas is formed by supplying titanium tetrachloride and magnesium into a mixing space that is held at an absolute pressure of 50-500 kPa and at a temperature not less than 1700° C.; (b) a step in which the mixed gas is introduced into a deposition space; (c) a step in which titanium metal is deposited and grown on a substrate for deposition; and (d) a step in which the mixed gas after the step (c) is discharged. In this connection, the deposition space has an absolute pressure of 50-500 kPa, the substrate for deposition is arranged in the deposition space, and at least a part of the substrate for deposition is held within the temperature range of 715-1500° C.

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Patent Owner(s)

  • HITACHI METALS, LTD.;TEKNA PLASMA SYSTEMS INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boulos, Maher I Sherbrooke, US 34 1042
Fukumaru, (nee ABE) Mariko Yasugi, JP 1 10
Guo, Jiayin Sherbrooke, US 15 254
Han, Gang Yasugi, JP 65 309
Jurewicz, Jerzy Sherbrooke, US 20 737
Shoji, Tatsuya Yasugi, JP 17 125
Uesaka, Shujiroh Yasugi, JP 10 56

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