Positive resist composition and method of pattern formation with the same

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United States of America Patent

PATENT NO 8871421
APP PUB NO 20070178405A1
SERIAL NO

11492123

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Abstract

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A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

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Patent Owner(s)

  • FUJIFILM CORPORATION;FUJI PHOTO FILM CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inabe, Haruki Shizuoka, JP 42 943
Kanda, Hiromi Shizuoka, JP 50 883
Kanna, Schinichi Shizuoka, JP 1 6

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