Reducing back-reflection in laser micromachining systems
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United States of America Patent
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Nov 4, 2014
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app pub date -
Dec 17, 2010
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Dec 17, 2010
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Abstract
Systems and methods reduce or prevent back-reflections in a laser processing system. A system includes a laser source to generate an incident laser beam, a laser beam output to direct the incident laser beam toward a work surface along a beam path, and a spatial filter. The system further includes a beam expander to expand a diameter of the incident laser beam received through the spatial filter, and a scan lens to focus the expanded incident laser beam at a target location on a work surface. A reflected laser beam from the work surface returns through the scan lens to the beam expander, which reduces a diameter of the reflected beam and increases a divergence angle of the reflected laser beam. The spatial filter blocks a portion of the diverging reflected laser beam from passing through the aperture and returning to the laser beam output.
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Patent Owner(s)
- ELECTRO SCIENTIFIC INDUSTRIES, INC.
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Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Alpay, Mehmet E | Portland, US | 18 | 160 |
Li, Guangyu | Portland, US | 17 | 336 |
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