Photosensitive transparent resin composition, production method of color filter, and color filter
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 11, 2014
Issued Date -
N/A
app pub date -
Mar 30, 2009
filing date -
Mar 31, 2008
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
With the objective of providing a photosensitive transparent resin composition that is reduced in the exposure illuminance dependency, allows high residual film ratio and little development scum and can stably form a pattern with good resolution, a color filter ensuring little decrease in the transmittance for visible light and enabling display of a high-quality definite image, and a production method thereof, there is provided a photosensitive transparent resin composition containing at least a polymerizable monomer, an alkali-soluble resin, a photopolymerization initiator and a compound represented by the following formula (I):
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully