Semiconductor device

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United States of America Patent

PATENT NO 8890281
SERIAL NO

13493848

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Abstract

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According to one embodiment, a semiconductor device includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a first conductivity type, a third semiconductor layer of a second conductivity type, an isolation layer, and a guard ring layer of the second conductivity type. The second semiconductor layer is provided on the first semiconductor layer. The third semiconductor layer is provided on the second semiconductor layer to be joined to the second semiconductor layer. The isolation layer surrounds a periphery of the third semiconductor layer and is deeper than the third semiconductor layer. The guard ring layer is provided between the third semiconductor layer and the isolation layer, adjacent to the third semiconductor layer, and deeper than the third semiconductor layer.

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Patent Owner(s)

  • KABUSHIKI KAISHA TOSHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shimizu, Mariko Tokyo, JP 73 2023
Shirai, Koji Kanagawa-ken, JP 37 298

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