Lithographic apparatus and method
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United States of America Patent
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Nov 25, 2014
Issued Date -
N/A
app pub date -
Jun 21, 2006
filing date -
Jun 21, 2006
priority date (Note) -
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Abstract
A lithographic apparatus includes an illumination system, an array of individually controllable elements, a projection system, and a control system. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The control system calculates a pattern that is to be formed on the array of individually controllable elements. The calculation includes an adjustment of the pattern, such that its focal plane is shifted in response to a measured separation between the target portion of the substrate and a focal plane of the projection system.
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