Stage apparatus, exposure apparatus and device fabrication method
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United States of America Patent
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Dec 2, 2014
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N/A
app pub date -
Dec 6, 2011
filing date -
Dec 14, 2010
priority date (Note) -
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Abstract
The present invention provides a stage apparatus including a first Y-axis interferometer which is supported by a base portion, and configured to detect a position of a first end surface of a table in a Y-axis direction, a second Y-axis interferometer which is supported by the base portion, and configured to detect a position of a second end surface of the table in the Y-axis direction, and a third Y-axis interferometer which is supported by the base portion so as to be spaced apart from the first Y-axis interferometer and the second Y-axis interferometer in an X-axis direction, and configured to detect a distance according to which a distance between the first Y-axis interferometer and the second Y-axis interferometer in the Y-axis direction can be obtained.
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