Variable flow resistance system with circulation inducing structure therein to variably resist flow in a subterranean well
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United States of America Patent
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Dec 9, 2014
Grant Date -
May 10, 2012
app pub date -
Jan 16, 2012
filing date -
Aug 18, 2009
priority date (Note) -
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Abstract
A flow control device can include a surface that defines a chamber and includes a side perimeter and opposing end surfaces, a greatest distance between the opposing end surfaces being smaller than a largest dimension of the opposing end surfaces, a first port through one of the end surfaces, and a second port through the surface and apart from the first port, the side perimeter surface being operable to direct flow from the second port to rotate about the first port. Another device can include a cylindroidal chamber for receiving flow through an inlet and directing the flow to an outlet, a greatest axial dimension of the cylindroidal chamber being smaller than a greatest diametric dimension of the cylindroidal chamber, the cylindroidal chamber promoting rotation of the flow based on a characteristic of the inflow through the inlet. The device can have a flow path structure in the cylindroidal chamber.
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