Imprint method, imprinting equipment, and method for manufacturing semiconductor device

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United States of America Patent

PATENT NO 8906281
SERIAL NO

13402244

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Abstract

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In an imprint method according to one embodiment, a template on which a template pattern is formed is pushed against resist on a substrate to be transferred while the resist is cured in this state. The template is subsequently separated from the cured resist. The template is then degassed from the template pattern surface side between after the template is separated from the cured resist and till the template is pushed against resist at the next shot.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Furutono, Yohko Kanagawa, JP 10 53
Hatano, Masayuki Kanagawa, JP 51 381
Ota, Takumi Kanagawa, JP 40 197

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