Pitch quartering to create pitch halved trenches and pitch halved air gaps

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United States of America Patent

PATENT NO 8907491
SERIAL NO

13630712

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Abstract

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A silicon structure is fabricated determining a pattern for wire trenches and air gaps. The wire trenches are created, and certain trenches are used as air gaps. The remaining wire trenches are used for metallization of inter connecting wires.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Van, Veenhuizen Marc Hillsboro, US 1 2

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