Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing method
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United States of America Patent
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Dec 16, 2014
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app pub date -
Mar 15, 2013
filing date -
Mar 16, 2012
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Abstract
According to one embodiment, an optimum imaging position detecting method includes acquiring an image of a predetermined area of a substrate surface, calculating, on the basis of the image of the predetermined area, peak intensity corresponding to a value obtained by subtracting average signal intensity of an area outside an intensity acquisition part from signal intensity of the intensity acquisition part, calculating variation of the peak intensity, executing acquiring the image of the predetermined area, calculating the peak intensity, and calculating the variation of the peak intensity at each of a plurality of imaging positions, and determining that a position of the maximum variation of the peak intensity is an optimum imaging position.
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