Electrical fuse structure and method of fabricating same
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United States of America Patent
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Dec 16, 2014
Issued Date -
N/A
app pub date -
Feb 26, 2013
filing date -
Sep 27, 2010
priority date (Note) -
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Abstract
A high programming efficiency electrical fuse is provided utilizing a dual damascene structure located atop a metal layer. The dual damascene structure includes a patterned dielectric material having a line opening located above and connected to an underlying via opening. The via opening is located atop and is connected to the metal layer. The dual damascene structure also includes a conductive feature within the line opening and the via opening. Dielectric spacers are also present within the line opening and the via opening. The dielectric spacers are present on vertical sidewalls of the patterned dielectric material and separate the conductive feature from the patterned dielectric material. The presence of the dielectric spacers within the line opening and the via opening reduces the area in which the conductive feature is formed. As such, a high programming efficiency electrical fuse is provided in which space is saved.
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