Exposure apparatus, exposure method, and device producing method
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United States of America Patent
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Dec 16, 2014
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N/A
app pub date -
Sep 2, 2011
filing date -
Dec 9, 2004
priority date (Note) -
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Abstract
An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.
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