In situ cleaning device for lithographic apparatus

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United States of America Patent

PATENT NO 8921807
APP PUB NO 20120288799A1
SERIAL NO

13462013

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Abstract

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A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miyake, Akira Nasukarasuyama, JP 114 1328
Takase, Hiromitsu Utsunomiya, JP 14 224
Tanaka, Ichiro Utsunomiya, JP 101 707

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