Method for controlling ion energy in radio frequency plasmas

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United States of America Patent

PATENT NO 8933629
SERIAL NO

14075026

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Abstract

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A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component.

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Patent Owner(s)

  • RUHR-UNIVERSITÄT BOCHUM

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brinkmann, Ralf Peter Erkrath, DE 4 55
Czarnetzki, Uwe Bochum, DE 3 62
Heil, Brian George Wiesbaden, DE 2 53
Mussenbrock, Thomas Wuppertal, DE 3 54

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