Photomask blank, photomask, method of manufacturing the same, and method of manufacturing a semiconductor device

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United States of America Patent

PATENT NO 8940462
SERIAL NO

13121851

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Abstract

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[Object] A photomask blank for use in producing a photomask for exposure with an ArF excimer laser. The photomask blank is intended to be applied to the 32-nm DRAM half-pitch (hp) and succeeding generations in the semiconductor design rule.

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Patent Owner(s)

  • HOYA CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Masahiro Tokyo, JP 98 954
Kominato, Atsushi Tokyo, JP 35 142

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