Resist composition and method for producing resist pattern

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United States of America Patent

PATENT NO 8940473
SERIAL NO

13404226

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Abstract

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A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II).

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Patent Owner(s)

  • SUMITOMO CHEMICAL COMPANY, LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ichikawa, Koji Osaka, JP 299 1930
Mukai, Yuichi Osaka, JP 20 93
Yamamoto, Satoshi Osaka, JP 492 4092

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