Method for producing fractured fragments of polycrystalline silicon

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United States of America Patent

PATENT NO 8944353
APP PUB NO 20120256023A1
SERIAL NO

13431005

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Abstract

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A method for producing fractured fragments of polycrystalline silicon having a fracturing process fracturing fragments of polycrystalline silicon between a pair of rolls which are rotated in a counter direction each other around parallel axes, in which: the rolls have a plurality of fracturing teeth protruding radially-outwardly from outer peripheral surfaces thereof; the fracturing teeth have spherical top surfaces and conical or cylindrical side surfaces; the fracturing process is performed in fracturing ratio of equal to or more than 1.0 to less than 1.5, and the fracturing ratio is specified by a maximum length of polycrystalline silicon before fracturing with respect to a facing distance between the top surfaces of the fracturing teeth at a facing part of the rolls.

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Patent Owner(s)

Patent OwnerAddress
HIGH-PURITY SILICON CORPORATION5 MITA-CHO YOKKAICHI-SHI MIE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sato, Motoki Naka-gun, JP 35 77
Sato, Shigeru Misawa, JP 171 2216

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