Chemical mechanical polishing conditioner

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8951099
APP PUB NO 20120220205A1
SERIAL NO

13393774

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Abstract

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A chemical mechanical polishing (CMP) conditioner includes a ceramic substrate having a major surface, and an abrasive coating overlying the major surface. The major surface can include micro-protrusions arranged in a curved pattern. Alternatively, the micro-protrusions can be arranged in an irregular pattern.

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Patent Owner(s)

  • SAINT-GOBAIN ABRASIFS;SAINT-GOBAIN ABRASIVES, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hall, Richard W J Southborough, US 14 140
Ramanath, Srinivasan Holden, US 63 1197
Schulz, Eric M Worcester, US 6 110
Wu, Jianhui Ashland, US 38 212

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