Gas delivery system with constant overpressure relative to ambient to system with varying vacuum suction
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United States of America Patent
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Feb 17, 2015
Issued Date -
N/A
app pub date -
Sep 10, 2010
filing date -
May 11, 2007
priority date (Note) -
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Abstract
A system operating in an environment having an ambient pressure, the system comprising: a reactor configured to combine a plasma stream, powder particles and conditioning fluid to alter the powder particles and form a mixture stream; a supply chamber coupled to the reactor; a suction generator configured to generate a suction force at the outlet of the reactor; a fluid supply module configured to supply the conditioning fluid at an original pressure; and a pressure regulation module configured to: receive the conditioning fluid from the fluid supply module, reduce the pressure of the conditioning fluid from the original pressure to a selected pressure relative to the ambient pressure regardless of any changes in the suction force at the outlet of the reactor, and supply the conditioning fluid at the selected pressure to the supply chamber.
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