Method of determining mask pattern and exposure condition, storage medium, and computer

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United States of America Patent

PATENT NO 8958059
APP PUB NO 20140146311A1
SERIAL NO

14089857

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Abstract

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A determining method includes the steps of setting a first parameter to define the shape of the plurality of pattern elements of the mask, setting a second parameter to define the effective light source distribution; and repeating the process of calculation of the image of the mask pattern and calculation of a value of an evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the mask pattern, wherein parameters of pattern elements are set as one parameter by using a value of an index representing the proximity effect.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mikami, Koji Nikko, JP 54 403

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