Pellicles with reduced particulates

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United States of America Patent

PATENT NO 8968971
APP PUB NO 20140255827A1
SERIAL NO

13789894

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Abstract

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Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.

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Patent Owner(s)

Patent OwnerAddress
MICRO LITHOGRAPHY INC1247 ELKO DRIVE SUNNYVALE CA 94089

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wang, Ching-Bore Fremont, US 9 94

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