Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 3, 2015
Grant Date -
Jul 11, 2013
app pub date -
Jan 11, 2012
filing date -
Jan 11, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully