Method for producing synthetic quartz glass
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United States of America Patent
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Mar 10, 2015
Grant Date -
May 30, 2013
app pub date -
Nov 23, 2012
filing date -
Nov 25, 2011
priority date (Note) -
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Abstract
A method for producing synthetic quartz glass comprises providing a liquid SiO2 feedstock material containing mainly octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material into a feedstock vapor, converting the feedstock vapor into SiO2 particles, depositing the SiO2 particles on a deposition surface while forming a porous SiO2 soot body, and vitrifying the SiO2 soot body while forming the synthetic quartz glass. To produce large-volume cylindrical soot bodies with outer diameters of more than 300 mm of improved material homogeneity, the liquid feedstock material contains additional components comprising hexamethylcyclotrisiloxane D3 and its linear homolog with a weight fraction mD3, dodecamethylcyclohexasiloxane D6 and its linear homolog with a weight fraction mD6, and tetradecamethylcycloheptasiloxane D7 and/or hexadecamethylcyclooctasiloxane D8 and its linear homologs with a weight fraction mD7+. The weight ratio mD3/mD6 is in a range between 0.5 and 500 and the weight fraction mD7+ is at least 20 wt. ppm.
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