Atomizing method for producing synthetic quartz glass
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United States of America Patent
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Mar 24, 2015
Grant Date -
May 30, 2013
app pub date -
Nov 23, 2012
filing date -
Nov 25, 2011
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Abstract
The present invention relates to a method for producing synthetic quartz glass, comprising the steps of: providing a liquid SiO2 feedstock material (105), which comprises more than 70% by wt. of the octamethylcyclotetrasiloxane D4, vaporizing the SiO2 feedstock material (105) into a gaseous SiO2 feedstock vapor (107), converting the SiO2 feedstock vapor (107) into SiO2 particles, depositing the SiO2 particles on a deposition surface (160) while forming a SiO2 soot body (200), vitrifying the SiO2 soot body (200) while forming the synthetic quartz glass. According to the invention it is provided that vaporizing the heated SiO2 feedstock material (105) comprises an injection phase in an expansion chamber (125) in which the heated SiO2 feedstock material (105) is atomized into droplets, the droplets having a mean diameter of less than 5 pm, preferably less than 2 μm.
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