Substrate laser oxide removal process followed by electro or immersion plating

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United States of America Patent

PATENT NO 8985050
APP PUB NO 20110104396A1
SERIAL NO

12940703

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Abstract

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Method of ablating the surface of a substrate including providing a dry substrate and an electrolyte source, ablating the surface of the dry substrate to at least partially remove a native oxide layer, and immersing the ablated dry substrate in the electrolyte source, in which the dry substrate is ablated prior to being introduced into the electrolyte source. Also provided is a method of ablating the surface of a substrate that includes providing a dry substrate and an electrolyte, depositing a portion of the electrolyte on the substrate at a thickness of less than 10 microns and ablating the surface of the substrate with the electrolyte applied thereon. System for use in the ablation of the surface of a substrate are also provided.

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Patent Owner(s)

Patent OwnerAddress
THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK535 WEST 116TH STREET 412 LOW MEMORIAL LIBRARY MC 4308 NEW YORK NY 10027

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Von, Gutfeld Robert J New York, US 65 2155

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