Apparatus and method for indirect surface cleaning

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United States of America Patent

PATENT NO 8986460
APP PUB NO 20140283873A1
SERIAL NO

14294728

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a pellicle disposed across the photomask, and cleaning the photomask. The cleaning the photomask includes directing a laser beam through the pellicle toward the photomask, the laser beam having a wavelength that is substantially equal to a local maximum of an absorption spectrum of the photomask, heating the photomask with the laser beam, and transferring heat from the photomask to a contaminant disposed on the photomask, thereby thermally decomposing the contaminant.

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Patent Owner(s)

  • RAVE, LLC

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brinkley, David Baltimore, US 18 69
LeClaire, Jeffrey E Boca Raton, US 23 110
Roessler, Kenneth G Boca Raton, US 14 108

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