Alignment of single-mode polymer waveguide (PWG) array and silicon waveguide (SiWG) array for providing adiabatic coupling
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United States of America Patent
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Apr 14, 2015
Grant Date -
Apr 24, 2014
app pub date -
Oct 7, 2013
filing date -
Oct 18, 2012
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Abstract
Alignment of a single-mode polymer waveguide (PWG) array fabricated on a polymer with a silicon waveguide (SiWG) array fabricated on a silicon (Si) chip and thereby realizing an adiabatic coupling. A stub and a groove are fabricated with high precision and made to function as the absolute positioning reference to provide a self-alignment according to the groove and the stub. In a PWG patterning by photolithography, plural masks are used, but the fabrication is made along the alignment base line for mask and thus a high precision is achieved with respect to error δx. In a PWG patterning by nano imprint, a high precision in the fabrication is also achieved with respect to error δx and δy.
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