Chemical vapour deposition system and process
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United States of America Patent
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Apr 21, 2015
Grant Date -
Dec 22, 2011
app pub date -
Feb 12, 2010
filing date -
Feb 12, 2009
priority date (Note) -
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Abstract
A chemical vapour deposition system, including: a process tube for receiving at least one sample, the process tube being constructed of silicon carbide, impregnated with silicon, and coated with silicon carbide; a pumping system to evacuate the process tube to high vacuum; one or more gas inlets for introducing one or more process gases into the evacuated process tube; and a heater to heat the process tube and thereby heat the one or more process gases and the at least one sample within the process tube to cause a material to be deposited onto the at least one sample within the process tube by chemical vapour deposition.
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