Photo-patternable dielectric materials and formulations and methods of use

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United States of America Patent

PATENT NO 9012587
APP PUB NO 20130292163A1
SERIAL NO

13861452

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Abstract

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Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Allen, Robert David San Jose, US 68 792
Brock, Phillip Joe San Jose, US 31 609
Davis, Blake W San Jose, US 14 241
Lin, Qinghuang Yortown Heights, US 151 2185
Miller, Robert Dennis San Jose, US 97 2061
Nelson, Alshakim San Jose, US 55 622
Sooriyakumaran, Ratnam San Jose, US 126 2261

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