Positive resist composition for immersion exposure and pattern-forming method using the same

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United States of America Patent

PATENT NO 9023576
APP PUB NO 20110076622A1
SERIAL NO

12917953

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Abstract

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A positive resist composition for immersion exposure comprises: (A) a resin containing at least one repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and radiation.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inabe, Haruki Shizuoka, JP 42 943
Kanda, Hiromi Shizuoka, JP 50 883
Kanna, Shinichi Shizuoka, JP 102 1310

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