Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition

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United States of America Patent

PATENT NO 9023579
APP PUB NO 20120237874A1
SERIAL NO

13485793

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Abstract

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According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shibuya, Akinori Shizuoka, JP 81 335
Yamaguchi, Shuhei Shizuoka, JP 91 369

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