Method for fabricating a planar micro-tube discharger structure
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United States of America Patent
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May 5, 2015
Grant Date -
Apr 17, 2014
app pub date -
Dec 17, 2013
filing date -
Feb 24, 2012
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Abstract
A method for fabricating a semiconductor-based planar micro-tube discharger structure is provided, including the steps of forming on a substrate two patterned electrodes separated by a gap and at least one separating block arranged in the gap, forming an insulating layer over the patterned electrodes and the separating block, and filling the insulating layer into the gap. At least two discharge paths are formed. The method can fabricate a plurality of discharge paths in a semiconductor structure, the structure having very high reliability and reusability.
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