Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

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United States of America Patent

PATENT NO 9034558
APP PUB NO 20130115557A1
SERIAL NO

13808489

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Abstract

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Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Iizuka, Yusuke Shizuoka, JP 23 92
Shibuya, Akinori Shizuoka, JP 81 336
Yamaguchi, Shuhei Shizuoka, JP 91 369

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