Negative resist composition and pattern forming method using the same

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United States of America Patent

PATENT NO 9034560
APP PUB NO 20140227642A1
SERIAL NO

14255113

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Abstract

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A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shirakawa, Koji Shizuoka, JP 26 225
Yatsuo, Tadateru Shizuoka, JP 9 57

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