Exposure apparatus and device fabrication method
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United States of America Patent
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May 19, 2015
Grant Date -
Nov 15, 2012
app pub date -
May 7, 2012
filing date -
May 10, 2011
priority date (Note) -
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Abstract
The present invention provides an exposure apparatus including a measurement unit configured to measure a position of the mark on a substrate, and a control unit configured to control an amount of light on a predetermined plane of an optical system included in the measurement unit, wherein an amount of light emitted by a light source is smaller in a non-measurement period in which the position of the mark is not measured than in a measurement period in which the position of the mark is measured, and the control unit sets a transmittance in an optical path between the light source and the predetermined plane to be higher in the non-measurement period than in the measurement period.
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