X-ray apparatus and its adjusting method
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United States of America Patent
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May 19, 2015
Grant Date -
Sep 19, 2013
app pub date -
Mar 4, 2013
filing date -
Mar 13, 2012
priority date (Note) -
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Abstract
An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted.
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