Storage medium storing computer program for determining at least one of exposure condition and mask pattern
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United States of America Patent
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May 19, 2015
Grant Date -
Aug 25, 2011
app pub date -
Feb 23, 2011
filing date -
Feb 24, 2010
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Abstract
A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.
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