Spectral purity filters for use in a lithographic apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9041912
APP PUB NO 20130010363A1
SERIAL NO

13617705

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banine, Vadim Yevgenyevich Helmond, NL 222 2857
Jak, Martin Jacobus Johan Eindhoven, NL 74 521
Soer, Wouter Anthon Nijmegen, NL 59 251
Van, Herpen Maarten Marinus Johannes Wilhelmus Heesch, NL 136 978
Yakunin, Andrey Mikhailovich Eindhoven, NL 3 22

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
11.5 Year Payment $7400.00 $3700.00 $1850.00 Nov 26, 2026
Fee Large entity fee small entity fee micro entity fee
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00