Self-conditioning polishing pad and a method of making the same

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United States of America Patent

PATENT NO 9050697
APP PUB NO 20130252519A1
SERIAL NO

13797121

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention is directed to a self-conditioning polishing pad. The self-conditioning polishing pad comprises an insoluble polymeric foam matrix and insoluble polymeric foam particles within the foam matrix. The particles are coated with a water-soluble component over a portion of the surface area of the particle. The particles may have a diameter in the range of 5 to 1000 microns in diameter.

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Patent Owner(s)

Patent OwnerAddress
JH RHODES COMPANY INC2800 NORTH 44TH STREET SUITE 675 PHOENIX AS 85008

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Daskiewich, Scott B Oriskany, US 4 16

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