Sputtering target having amorphous and microcrystalline portions and method of producing same

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United States of America Patent

PATENT NO 9051646
APP PUB NO 20120085641A1
SERIAL NO

13267407

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Abstract

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A sputtering target is provided which ensures the production of unvaryingly homogenous layers of the sputtering material during the lifespan of the sputtering target. The sputtering target includes a mixture of oxides of indium, zinc, and gallium, the mixture containing at least one ternary mixed oxide of indium, zinc, and gallium and at least one amorphous phase. The portion of ternary mixed oxides of indium, zinc, and gallium is at least 50 weight percent, relative to the total weight of the mixture, and the portion of amorphous phase is at least 20 weight percent, relative to the total weight of the mixture.

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Patent Owner(s)

Patent OwnerAddress
MATERION ADVANCED MATERIALS GERMANY GMBH63755 ALZENAU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Herzog, Andreas Bruchköbel, DE 12 31
Schlott, Martin Offenbach, DE 26 97
Schneider-Betz, Sabine Dreieich, DE 3 11
Stahr, Christoph Kahl am Main, DE 3 19

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