Chlorine resistant amides, polyamides, and membranes made from the same

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United States of America Patent

PATENT NO 9056284
APP PUB NO 20140042082A1
SERIAL NO

13572431

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A chlorine resistant polyamide is formed from the reaction product of an amine and an acid chloride monomer wherein both the amine and the acid chloride monomer are modified with electron-withdrawing groups that exhibit sufficient activity to (i) minimize any chlorination on both the amine and acid chloride and (ii) minimize N-chlorination. A membrane is made from the polyamide for use, for example, in a desalination unit.

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Patent OwnerAddress
THE UNITED STATES AS REPRESENTED BY THE SECRETARY OF THE INTERIOR1849 C STREET NW WASHINGTON DC 20240

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Murphy, Andrew Patrick Littleton, US 5 38
Porras, Mendoza Yuliana Elvira Arvada, US 2 1
Riley, Robert Lee La Jolla, US 6 40

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