Etching composition and method of manufacturing a display substrate using the system
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United States of America Patent
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Jun 23, 2015
Grant Date -
May 9, 2013
app pub date -
Jun 27, 2012
filing date -
Nov 8, 2011
priority date (Note) -
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Abstract
An etching composition and a method of manufacturing a display substrate using the etching composition are disclosed. The etching composition includes phosphoric acid (H3PO4) of about 40% by weight to about 70% by weight, nitric acid (HNO3) of about 5% by weight to about 15% by weight, acetic acid (CH3COOH) of about 5% by weight to about 20% by weight, and a remainder of water. Thus, a metal layer including copper may be stably etched.
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