Manufacturing of hard masks for patterning magnetic media

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United States of America Patent

PATENT NO 9064521
SERIAL NO

13938131

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Abstract

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Embodiments of the present invention relate to systems and methods for designing and manufacturing hard masks used in the creation of patterned magnetic media and, more particularly, patterned magnetic recording media used in hard disk drives (e.g., bit patterned media (BPM)). In some embodiments, the hard mask incorporates at least one layer of Ta (tantalum) and at least one layer of C (carbon) and is used during ion implantation of a pattern onto magnetic media. The hard mask can be fabricated with a high aspect ratio to achieve small feature sizes while maintaining its effectiveness as a mask, is robust enough to withstand the ion implantation process, and can be removed after the ion implantation process with minimal damage to the magnetic media.

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Patent Owner(s)

  • WD MEDIA, INC.;WD MEDIA, LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dorsey, Paul C Los Altos, US 23 685

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