Barrier trench structure and methods of manufacture
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United States of America Patent
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Jun 23, 2015
Grant Date -
Nov 22, 2012
app pub date -
May 16, 2011
filing date -
May 16, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
A method includes forming at least one shallow trench isolation structure in a substrate to isolate adjacent different type devices. The method further includes forming a barrier trench structure in the substrate to isolate diffusions of adjacent same type devices. The method further includes spanning the barrier trench structure with material to connect the diffusions of the adjacent same type device, on a same level as the adjacent same type devices.
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