Vapour deposition process for the preparation of a chemical compound

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United States of America Patent

PATENT NO 9067790
APP PUB NO 20140072727A1
SERIAL NO

14117827

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Abstract

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A vapor deposition process for the preparation of a chemical compound, wherein the process comprises providing each component element of the chemical compound as a vapor, and co-depositing the component element vapors on a common substrate, wherein: the vapor of at least one component element is provided using a cracking source; the vapor of at least one other component element is provided using a plasma source; and at least one further component element vapor is provided; wherein the component elements react on the substrate to form the chemical compound.

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Patent Owner(s)

  • ILIKA TECHNOLOGIES LIMITED;TOYOTA MOTOR CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beal, Mark Stephen Chilworth Southampton, GB 2 5
Hayden, Brian Elliott Chilworth Southampton, GB 29 87
Lee, Christopher Edward Chilworth Southampton, GB 15 66
Lu, Xiaojuan Chilworth Southampton, GB 2 5
Smith, Duncan Clifford Alan Chilworth Southampton, GB 11 56
Yada, Chihiro Aichi, JP 23 180

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