Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these

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United States of America Patent

PATENT NO 9069246
APP PUB NO 20140349221A1
SERIAL NO

14458660

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Abstract

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An actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the formula (Z1), and the formula (Z1) is defined as herein,

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takizawa, Hiroo Shizuoka, JP 119 919
Tsuchimura, Tomotaka Shizuoka, JP 102 600

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